Wafer holding apparatus for ion implantation

Details Wafer holding apparatus for ion implantation Wafer holding apparatus for ion implantation

1984-01-05

1985-11-12

Dixon, Harold

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

2504923, 414222, 414225, A61K 2702

Patent

active

045530696

ABSTRACT:
An apparatus is disclosed for the implantation of ions into semiconductor wafers wherein a plurality of storage compartments are connected through valves to a vacuum chamber. A wafer handling device transfers wafers between the storage compartments and a wafer holding device. The wafer holding device positions the wafers in front of an ion beam source. The wafer holding device is a rotatable frustum having a rear end, front end and four trapezoidally shaped sides. Clamps are provided on each side for holding the wafer against the side.

REFERENCES:
patent: 3874525 (1975-04-01), Hassan et al.
patent: 3921788 (1975-11-01), Roberson et al.
patent: 4047624 (1977-09-01), Dorenbos
patent: 4346301 (1982-08-01), Robinson et al.
patent: 4398079 (1983-08-01), Dard et al.
patent: 4498833 (1985-02-01), Hertel

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