Wafer holding apparatus

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

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Details

C118S668000

Reexamination Certificate

active

10450654

ABSTRACT:
The invention provides a wafer holding apparatus which enables ascertainment of gripping and presence/absence of a wafer through use of single detection means.The apparatus has drive means (2) having a pressing element (8) which advances or recedes in a longitudinal direction; and detection means (9) for detecting advancement/receding of the pressing element (8). When the detection means (9) has detected that the pressing element (8) has advanced to and come to a halt at a predetermined position, the wafer is determined to be properly held. When the detection means (9) has detected that the pressing element (8) has advanced in excess of the predetermined position, the wafer is determined not to be present on the wafer holding apparatus.

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patent: 2000-306982 (2000-11-01), None

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