Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2007-03-06
2007-03-06
Kackar, Ram (Department: 1763)
Coating apparatus
Gas or vapor deposition
Work support
C118S668000
Reexamination Certificate
active
10450654
ABSTRACT:
The invention provides a wafer holding apparatus which enables ascertainment of gripping and presence/absence of a wafer through use of single detection means.The apparatus has drive means (2) having a pressing element (8) which advances or recedes in a longitudinal direction; and detection means (9) for detecting advancement/receding of the pressing element (8). When the detection means (9) has detected that the pressing element (8) has advanced to and come to a halt at a predetermined position, the wafer is determined to be properly held. When the detection means (9) has detected that the pressing element (8) has advanced in excess of the predetermined position, the wafer is determined not to be present on the wafer holding apparatus.
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Kabushiki Kaisha Yaskawa Denki
Kackar Ram
MacArthur Sylvia R.
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