Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent
1998-05-29
2000-09-12
Utech, Benjamin L.
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
438692, H01L 21302, H01L 21461
Patent
active
061177768
ABSTRACT:
A wafer holder chuck has support for fixing a semiconductor wafer during nding. There is a method of producing a semiconductor wafer which has two flat-ground sides and a rounded edge. The wafer holder has a support which is composed of a soft material. The method has the semiconductor wafer fixed on a wafer holder having a soft support during grinding of the first side and has the wafer fixed on a wafer holder having a hard support during grinding of the second side.
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Drexler Robert
Huber Anton
Deo Duy-Vu
Utech Benjamin L.
Wacker Siltronic Gesellschaft fur Halbleitermaterialien AG
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