Wafer handling system

Details Wafer handling system Wafer handling system

1987-02-09

1989-07-11

Werner, Frank E.

Material or article handling

Article reorienting device

414752, 414737, 414757, 414225, 414416, 414331, 4147441, 901 47, 901 27, B65G 4724

Patent

active

048466263

ABSTRACT:
Apparatus is set forth for prealigning the transport stage of an automated wafer handling lithographic system. The wafer is first rotated and its displacement in X, Y, and .THETA. from a desired orientation is determined. Rotation of the wafer is stopped when its angular position reaches a desired orientation. The wafer chuck of the transport stage is then displaced to compensate for any deviation of the wafer in the X and Y directions from a desired rectilinear orientation. This permits the wafer stage to present the wafer to the exposure station of a lithographic system aligned in the X, Y and .theta. directions.

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patent: 4107948 (1978-08-01), Molaug
patent: 4228886 (1980-10-01), Moran
patent: 4425075 (1984-01-01), Quinn
patent: 4433953 (1984-02-01), Muench
patent: 4457664 (1984-07-01), Judell et al.
patent: 4501527 (1985-02-01), Jacoby et al.
patent: 4539695 (1985-09-01), La Fiandra
patent: 4556362 (1985-12-01), Bahnck et al.
patent: 4566726 (1986-01-01), Correnti et al.

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