Wafer handling apparatus

Details Wafer handling apparatus Wafer handling apparatus

1989-12-15

1991-05-14

Yuen, Henry C.

Heating

Work chamber having heating means

Having means by which work is progressed or moved mechanically

432 5, 432152, 432128, 432253, F27B 900

Patent

active

050151770

ABSTRACT:
A wafer handling apparatus has a common desk including a top surface having a front zone, a middle zone and a rear zone, the front zone being capable of receiving plural indexers functioning as a wafer sender and/or receiver, a couple of wafer processing units disposed adjacent lateral sides of the middle zone, a wafer baking oven disposed adjacent a middle of the rear zone, and a wafer handling mechanism disposed adjacent a middle of the front zone, the wafer processing units and the oven.

REFERENCES:
patent: 3946484 (1976-03-01), Aronstein et al.
patent: 3946931 (1976-03-01), Bahnck et al.
patent: 4520834 (1985-06-01), DiCicco
patent: 4555273 (1985-11-01), Collins et al.
patent: 4626203 (1986-12-01), Sakamoto
patent: 4669938 (1987-06-01), Hayward
patent: 4692115 (1987-09-01), Aldridge et al.

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