Wafer handler

Details Wafer handler Wafer handler

1976-09-07

1977-07-26

Nozick, Bernard

Work holders

With fluid means

Vacuum-type holding means

55385A, 55416, 55DIG29, 98115LH, 279 3, B25B 1100

Patent

active

040378306

ABSTRACT:
Disclosed is a chuck or handler for carrying thin, substantially planar workpieces intermediate process stations but while maintaining a clean air environment. The chuck includes a substantially planar surface having a workpiece receiving area thereon and a plurality of channels adjacent one edge of the planar surface but superimposed thereof. A conduit is in fluid communication with the channels and includes a foraminous diffuser element in the conduit to equalize the pressure of fluid entering the channels. A source of at least Class 100 air is connected to the conduit for supplying the channels with the gaseous media so that gaseous media emanating from the channels is essentially laminar and flows across the work area to create a surface attachment effect of the air or gaseous media over the workpiece on the work area.
The purpose of this abstract is to enable the public and the Patent Office to determine rapidly the subject matter of the technical disclosure of the Application. This abstract is neither intended to define the invention of the Application nor is it intended to be limiting as to the scope thereof.

REFERENCES:
patent: 2366925 (1945-01-01), Schmid
patent: 3368523 (1968-02-01), Becker
patent: 3820536 (1974-06-01), Anspach, Jr. et al.
patent: 3976288 (1976-08-01), Cuomo, Jr.

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