Wafer gap conductivity cell for characterizing process vessels a

Details Wafer gap conductivity cell for characterizing process vessels a Wafer gap conductivity cell for characterizing process vessels a

1996-06-07

1999-03-16

Alexander, Lyle A.

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Means for analyzing liquid or solid sample

205705, 205789, 2057895, 422 62, 422 8201, 436106, 436107, 436108, 436150, 134 2, 134 26, 134902, 324425, 324439, 324446, 324449, G01N 2700

Patent

active

058825983

ABSTRACT:
A conductivity cell for use in determining ionic concentrations in the gap between two semiconductor substrates or wafers. The wafer gap conductivity cell is composed of two flat electrodes separated by a fixed gap. The electrodes are fabricated from wafers of the same type and dimensions used as semiconductor device substrates. All or a portion of the surfaces of the wafer electrodes are coated with a conductive material. The wafer gap conductivity cell is placed in a wafer cassette or other suitable wafer holder, whose other slots are filled with wafers which are to be cleaned or subjected to another fabrication process. The cell can be used to characterize the processes used during the fabrication of semiconductor devices and assist in investigating the effect on the processes of different process vessel designs.

REFERENCES:
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4872356 (1989-10-01), Barnett et al.
patent: 5069235 (1991-12-01), Veffer et al.
patent: 5647386 (1997-07-01), Kaiser
Tonti, A., "A SImple Model For Rinsing," pp. 41-47, Oct. 14-18, 1992, Phoenix, Arizona. Proceedings of the Second International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Proceedings vol. 95-12.
Hiratsuka, Yutaka, et al., "Equipment for Wafer Cleaning Parallel Down Flow Rinse," pp. 74-81, Oct., 1995, Chicago, Illinois. Proceedings of the Fourth International Sumposium on Cleaning Technology in Semiconductor Device Manufacturing, Proceedings vol. 95-20.
Rosato, J., et al., "Studies of Rinse Efficiencies in Wet Cleaning Tools." Paper presented at the third Internaitonal Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Electrochemical Society 184th Meeting, New Orleans, LA, Oct. 1993 (13 pages).
"Valco Two Position Valve Applications," Valco Instruments Co. Inc. Catalog, Analytical Components Devices and Systems, pp. 146-148.
1.0 General Description Sheet on "The Anatel A-100 Organic Carbon Analyzer," p. 1., Anatel Corp., Boulder, Co. (1993).
"Anatel A-1000, Total Organic Carbon Monitoring For Ultrapure Water Applications," pp. 2-8, Anatel Corp., Boulder, Co. (1993).

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