Metal working – Method of mechanical manufacture – Electrical device making
Reexamination Certificate
2005-05-19
2009-06-30
Arbes, C. J (Department: 3729)
Metal working
Method of mechanical manufacture
Electrical device making
C029S832000, C029S840000, C438S113000, C438S114000
Reexamination Certificate
active
07552528
ABSTRACT:
In slack removal processing for removing slack generated on a wafer sheet by heating blow, a wafer feeding plate is positioned at a height position between a first height position and a second height position. This makes it possible to decrease a gap between an upper end portion of an expanding ring and a lower face of the wafer sheet and allows efficient and uniform processing. Moreover, setting the height position so as to avoid the contact between the wafer sheet and the upper end portion of the expanding ring at least when the slack removal processing is completed reliably prevents shrinking operation of the wafer sheet from being disturbed by the contact between the wafer sheet and the upper end portion.
REFERENCES:
patent: 5882956 (1999-03-01), Umehara et al.
patent: 6514795 (2003-02-01), Jiang et al.
patent: 6894380 (2005-05-01), Jiang et al.
patent: 2006/0005911 (2006-01-01), Kubo et al.
patent: 2006/0012020 (2006-01-01), Gilleo
patent: 62-124911 (1987-06-01), None
patent: 2-231740 (1990-09-01), None
patent: 7-321070 (1995-12-01), None
patent: 2002-334853 (2002-11-01), None
patent: 2005-109043 (2005-04-01), None
Hirata Shuichi
Miyazaki Hirokuni
Narita Shoriki
Shida Satoshi
Tsujisawa Takafumi
Arbes C. J
Panasonic Corporation
Wenderoth , Lind & Ponack, L.L.P.
LandOfFree
Wafer expanding device, component feeder, and expanding... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wafer expanding device, component feeder, and expanding..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer expanding device, component feeder, and expanding... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4118165