Wafer edge inspection apparatus

Details Wafer edge inspection apparatus Wafer edge inspection apparatus

2007-10-09

2007-10-09

Rosenberger, Richard A. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237200

Reexamination Certificate

active

10992419

ABSTRACT:
A wafer edge inspection system utilizes a novel camera and mirror arrangement which conveys the images of the various near-edge wafer regions in piecewise fashion to a linear sensor array on a single line-scan sensor. This system is low-cost and compact, and may be integrated into various wafer handling or processing machines or systems.

REFERENCES:
patent: 6798503 (2004-09-01), Hiramoto et al.
patent: 2003/0169916 (2003-09-01), Hayashi
patent: 2004/0239920 (2004-12-01), Kreh et al.
patent: 2005/0024632 (2005-02-01), Plemmons et al.
patent: 2005/0280807 (2005-12-01), Backhauss et al.

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