Wafer edge exposure unit

Details Wafer edge exposure unit Wafer edge exposure unit

2011-03-08

2011-03-08

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000, C430S322000, C355S053000, C355S067000, C355S070000, C355S077000, C356S399000, C356S401000

Reexamination Certificate

active

07901854

ABSTRACT:
A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.

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