Wafer edge exposure apparatus, and wafer edge exposure method

Details Wafer edge exposure apparatus, and wafer edge exposure method Wafer edge exposure apparatus, and wafer edge exposure method

2005-04-05

2005-04-05

Gutierrez, Diego (Department: 2859)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C250S204000, C355S055000, C355S068000

Reexamination Certificate

active

06875971

ABSTRACT:
A wafer edge exposure apparatus is provided with an optical section for radiating exposure light onto the edge of a semiconductor wafer. The optical section is provided with a focus sensor for sensing a distance from the lower end of the optical section to the edge of the semiconductor wafer. There is provided a position control mechanism for moving the optical section vertically on the basis of a value detected by the focus sensor such that the distance matches a focal distance of the optical section.

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