Wafer edge detector

Data processing: measuring – calibrating – or testing – Measurement system – Orientation or position

Reexamination Certificate

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Details

C414S935000, C414S936000

Reexamination Certificate

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06934661

ABSTRACT:
A method for detecting wafer flat shift, and an apparatus (500) having two sensors (506a) and (506b) in a power supply circuit (600) for wafer fabrication equipment, the sensors (506a) and (506b) detecting a shift in wafer flat position from a desired position and shutting off the wafer fabrication equipment.

REFERENCES:
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4529932 (1985-07-01), Doueihi et al.
patent: 4752898 (1988-06-01), Koenig
patent: 4880348 (1989-11-01), Baker et al.
patent: 5452521 (1995-09-01), Niewmierzycki
patent: 5483138 (1996-01-01), Shmookler et al.
patent: 5725664 (1998-03-01), Nanbu et al.

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