Wafer edge deplater for chemical mechanical polishing of substra

Details Wafer edge deplater for chemical mechanical polishing of substra Wafer edge deplater for chemical mechanical polishing of substra

1998-06-04

2000-05-02

Phasge, Arun S.

Electrolysis: processes, compositions used therein, and methods

Electrolytic material treatment

Removing metal

205772, 205717, 205721, 205660, 205686, 204212, 204224M, C30B 3002

Patent

active

060568690

ABSTRACT:
A device for electrochemically deplating metal from side edges and a backside of a semiconductor wafer or substrate. The device includes a shaped cathode having a shape substantially corresponding to a shape of at least a portion of the semiconductor wafer, such that the shaped cathode at least partially covers the backside and at least partially covers the side edges of the semiconductor wafer. The position of at least one of the semiconductor wafer and the shaped cathode is altered by position altering apparatus during the electrochemical deplating.

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