Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-01-04
2005-01-04
Thomas, David B. (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S057000, C015S077000, C015S088100
Reexamination Certificate
active
06837777
ABSTRACT:
An improvement is disclosed in a brush cleaning apparatus for cleaning a major surface of a wafer and including wafer guide wheels for transporting the wafer. The improvement includes a polish pad material disposed on a circumference of the guide wheels. The polish pad material is a material used in chemical-mechanical polishing of the wafer. The polish pad material contacts an edge portion of the wafer during cleaning thereof, thereby removing contaminants from the edge portion of the wafer, so that edge cleaning is performed in situ in addition to the brush cleaning of the major surface of the wafer.
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Delehanty Donald J.
Khoury Raymond M.
Ocasio Jose M.
Ziemins Uldis A.
Thomas David B.
Wood Phillips Katz Clark & Mortimer
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