Semiconductor device manufacturing: process – Semiconductor substrate dicing
Reexamination Certificate
2007-01-08
2009-06-09
Lee, Hsien-ming (Department: 2823)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
C438S458000, C257SE21599, C451S009000
Reexamination Certificate
active
07544587
ABSTRACT:
A method of dividing, along lattice pattern-like dividing lines, a wafer which has the lattice pattern-like dividing lines and a polymer film on the front surface of a substrate and is processed to allow for division along the dividing lines, the method comprising a frame holding step for putting the wafer on the surface of an adhesive tape mounted on an annular frame; a wafer cooling step for cooling the wafer that is affixed to the surface of the adhesive tape mounted on the annular frame; and a diving step for dividing the wafer along the dividing lines by expanding the adhesive tape to which the cooled wafer is affixed.
REFERENCES:
patent: 5362681 (1994-11-01), Roberts et al.
patent: 5441615 (1995-08-01), Mukai et al.
patent: 6217663 (2001-04-01), Inokuchi et al.
patent: 2004/0266094 (2004-12-01), Nagai et al.
patent: 2005/0139964 (2005-06-01), Ando
patent: 2005/0153127 (2005-07-01), Aihara et al.
patent: 2006/0024924 (2006-02-01), Haji et al.
patent: 2006/0030129 (2006-02-01), Ohmiya et al.
patent: 2007/0197002 (2007-08-01), Kurosawa et al.
patent: 10 2004 029 091 (2004-06-01), None
patent: 3408805 (2003-03-01), None
patent: 2005-19769 (2005-01-01), None
Inaoka Tatsuya
Kise Taizo
Matsumoto Kohei
Mitani Koichi
Nakamura Masaru
Disco Corporation
Lee Hsien-ming
Parendo Kevin
Smith , Gambrell & Russell, LLP
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