Wafer detection circuitry for high vacuum use

Details Wafer detection circuitry for high vacuum use Wafer detection circuitry for high vacuum use

1982-05-18

1983-10-11

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, 204192SP, 204192C, 198502, C23C 1500

Patent

active

044090870

ABSTRACT:
Disclosed is a detector for determining the location of wafers moving in a sputtering system, for example, to and from the sputtering chamber where the wafers are processed, including a capacitive transducer, located in the path of travel of the wafers, to which is coupled an oscillator supplying a constant current thereto. This current is detected by a sensor, whose output is processed and applied to a comparator. The comparator is preferably preset to supply a digital "0" when the current through the transducer is at a static or no-wafer condition, and a digital "1" when the capacity of the transducer changes due to the presence of a wafer in close proximity to the transducer which is sensed as an increase in current which is reflected as a change of voltage level applied to the comparator.

REFERENCES:
patent: 4351714 (1982-09-01), Kuriyama
patent: 4352725 (1982-10-01), Tsukada
Mazza, I.B.M. J. Res. Develop. 14 (1970) No. 2, pp. 192-193.

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