Wafer defect inspection machine having a dual illumination...

Details Wafer defect inspection machine having a dual illumination... Wafer defect inspection machine having a dual illumination...

2005-03-15

2005-03-15

Le, Que T. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

C250S216000

Reexamination Certificate

active

06867424

ABSTRACT:
A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.

REFERENCES:
patent: 4881802 (1989-11-01), Stankewitz
patent: 5058982 (1991-10-01), Katzir

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