Wafer container and dusting prevention method thereof and...

Details Wafer container and dusting prevention method thereof and... Wafer container and dusting prevention method thereof and...

2005-06-14

2005-06-14

Meeks, Timothy (Department: 1762)

Coating processes

With post-treatment of coating or coating material

Liquid extraction of coating constituent or cleaning coating

C427S230000, C427S235000, C427S352000, C427S353000, C427S379000, C427S430100, C438S125000, C206S524300, C206S710000, C206S711000

Reexamination Certificate

active

06905731

ABSTRACT:
There are provided a dust generation preventing structure of a wafer storage case and a process for preventing dust generation thereof, wherein dust generation is effectively prevented by blocking or suppressing free movement of particles constantly generated from a surface of a wafer storage case of a synthetic resin with a coating layer of a surfactant, and a wafer storing method using the wafer storage case. The wafer storage case of synthetic resin is used for housing wafers, and a surface of the wafer storage case is coated with a coating layer of a coating agent to prevent dust generation from the surface.

REFERENCES:
patent: 6158721 (2000-12-01), Katou et al.
patent: 09-122610 (1997-05-01), None
patent: 10-056057 (1998-02-01), None
Abstract of Japanese Patent Publication No. 10056057A; dated Feb. 24, 1998.
Abstract of Japanese Patent Publication No. 04206548A; dated Jul. 28, 1992.
Abstract of Japanese Patent Publication No. 01199431A; dated Aug. 10, 1989.
Abstract of Japanese Patent Publication No. 06132386A; dated May 13, 1994.

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