Wafer cleaning tank

Details Wafer cleaning tank Wafer cleaning tank

1994-12-08

1996-04-02

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Miscellaneous

206454, 206711, 211 41, 269 43, 269296, 269903, B08B 1102

Patent

active

055031730

ABSTRACT:
A wafer cleaning tank including a tank body containing therein a cleaning solution, and wafer supporting device for substantially vertically supporting at least one wafer in the tank body, wherein the wafer supporting device includes a pair of confronting fixed wafer support members disposed in the tank body with a predetermined space therebetween and each having at least one side wafer-supporting portion, and a movable wafer support member vertically movably disposed centrally between the fixed wafer support members at a level below the fixed wafer support members and having at least one central wafer-supporting portion corresponding in position to the position of the side wafer-supporting portion of each of the fixed wafer support members, and wherein the side wafer-supporting portions and the central wafer-supporting portion jointly form a three-point support structure which supports the wafer at three points on the outer edge thereof. The wafer cleaning tank thus constructed is capable of cleaning a plurality of wafers at one time and well adaptable to the cleaning of wafers of different diameters.

REFERENCES:
patent: 4191295 (1980-03-01), Tams, III
patent: 4574950 (1986-03-01), Koe et al.

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