Wafer cleaning system with progressive megasonic wave

Details Wafer cleaning system with progressive megasonic wave Wafer cleaning system with progressive megasonic wave

1998-11-10

2000-02-08

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Automatic controls

134 58R, 134184, 134902, B08B 310

Patent

active

060217898

ABSTRACT:
Improved megasonic cleaning is obtained by use of an apparatus containing a plurality of transducers arranged to transmit a progressive megasonic wave through a liquid containing a planar surface of an object. The progression of the wave is preferably such that particles are carried by the wave toward the toward the edge of the wafer. The processes and apparatus are especially useful for cleaning wafers in the course of manufacturing integrated circuit chips.

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C.J. Keller, "Ultrasonic Fountain Processor", IBM Technical Disclosure Bulletin, vol. 10, No. 5, Oct. 1967, pp. 528-529.

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