Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent
1998-07-10
2000-06-06
Warden, Sr., Robert J.
Brushing, scrubbing, and general cleaning
Machines
Wiping
15 77, 15 883, A47L 102
Patent
active
060702842
ABSTRACT:
A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.
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Garcia Alejandro
Krick Brent
Nichtawitz Anthony
Nordeen Daniel
Oen Josh
Lichauco, Esq. Faustion A.
Olsen Kaj K.
Silikinetic Technology, Inc.
Warden, Sr. Robert J.
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