Wafer cleaning method and apparatus therefore

Details Wafer cleaning method and apparatus therefore Wafer cleaning method and apparatus therefore

1992-07-29

1994-02-22

Brunsman, David

Cleaning and liquid contact with solids

Processes

Gas or vapor condensation or absorption on work

134 11, 134 12, 134 30, 134 37, B08B 500

Patent

active

052883337

ABSTRACT:
A wafer cleaning method and apparatus in which a cleaning solution is caused to evaporate at a temperature below its boiling point, and cleaning vapor thus produced is applied at a temperature above its dew point to a wafer such as a semiconductor wafer. The wafer is cleaned without formation of colloidal silica in the absence of aerosol, or etched uniformly free of impurities. The wafer cleaning apparatus comprises a cleaning solution storage, a vapor generating section, a wafer supporting position of a wafer supporting device and a vapor supply section. These components are arranged in a housing to overlap one another in plan view and to lie vertically close to one another. The apparatus has a compact overall construction with simplified seals for preventing leakage of the cleaning vapor.

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patent: 4838476 (1989-06-01), Rahn

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