Wafer cleaning device

Details Wafer cleaning device Wafer cleaning device

1998-11-25

2000-08-15

Till, Terrence R.

Brushing, scrubbing, and general cleaning

Machines

Wiping

15 77, B08B 300, B08B 1100

Patent

active

06101656&

ABSTRACT:
A wafer-cleaning device comprises a looped belt forming an enclosed region and a pair of rollers. Each roller occupies one end inside the enclosed region. Furthermore, a supporting structure located inside the enclosed region not only supports the rollers, but also maintains some tension on the belt. Thus, one portion of the belt is flat. The supporting structure is capable of supporting a wafer as well. In addition, a wafer-rotating device can be installed next to the edge of a wafer so that the wafer can rotate in a prescribed direction while the wafer surface is cleaned.

REFERENCES:
patent: 5581837 (1996-12-01), Uchiyama et al.
patent: 5858109 (1999-01-01), Hymes et al.
patent: 5868857 (1999-02-01), Moinpour et al.
patent: 5911257 (1999-06-01), Morikawa et al.
patent: 5933902 (1999-08-01), Frey
patent: 5943725 (1999-08-01), Wandres

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