Wafer cleaning apparatus and structure for holding and transferr

Details Wafer cleaning apparatus and structure for holding and transferr Wafer cleaning apparatus and structure for holding and transferr

1998-10-23

2000-10-10

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 941, 1341001, 134902, 134113, 134157, B08B 300

Patent

active

061291005

ABSTRACT:
A transfer robot 2 for holding the peripheral edge of a wafer 1 and transferring the wafer 1, a turning-over alignment section 7 for turning over the wafer 1 and centering the wafer 1, and a transfer robot cleaning section 6 for cleaning holding portions 2a of the transfer robot 2 are provided. Besides, a wafer cleaning section 5 for cleaning the wafer 1 is provided and in this wafer cleaning section 5, a spinner 22 for chucking the wafer 1 and a nozzle 20 through which a cleaning liquid is jetted to this wafer 1. To this nozzle 20, a tank 11 for pure water for supplying pure water, a tank 12 for functional water for supplying a functional water, a tank 13 for chemical liquid for supplying a chemical liquid, and a cleaning liquid mixing portion 14 for storing these various kinds of cleaning liquids and mixing them are connected through supply lines.

REFERENCES:
patent: 2604108 (1952-07-01), Considine
patent: 4241877 (1980-12-01), Highes
patent: 4274812 (1981-06-01), Elvidge et al.
patent: 4366003 (1982-12-01), Korte et al.
patent: 4688918 (1987-08-01), Suzuki et al.
patent: 4787404 (1988-11-01), Klosterman et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4919853 (1990-04-01), Alvarez et al.
patent: 5061406 (1991-10-01), Cheng
patent: 5108778 (1992-04-01), Suzuki et al.
patent: 5129241 (1992-07-01), Kiuchi et al.
patent: 5172572 (1992-12-01), Ono
patent: 5370746 (1994-12-01), Pedersen et al.
patent: 5411042 (1995-05-01), Suzuki et al.
patent: 5487398 (1996-01-01), Ohmi et al.
patent: 5498294 (1996-03-01), Matsushita et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5520744 (1996-05-01), Fujikawa et al.
patent: 5545073 (1996-08-01), Kenisel et al.
patent: 5578127 (1996-11-01), Kimura
patent: 5599372 (1997-02-01), Pommier
patent: 5672230 (1997-09-01), Park et al.
patent: 5701627 (1997-12-01), Matsumura et al.
patent: 5704990 (1998-01-01), Krambrock et al.
patent: 5706842 (1998-01-01), Caimi et al.
patent: 5722441 (1998-03-01), Teramoto
patent: 5730806 (1998-03-01), Caimi et al.
patent: 5776296 (1998-07-01), Matthews
patent: 6015718 (2000-01-01), Rathbone

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