Wafer chuck with wafer cleaning feature

Details Wafer chuck with wafer cleaning feature Wafer chuck with wafer cleaning feature

1981-11-30

1984-02-28

Watson, Robert C.

Work holders

With product discharge facilitator

Product mover

269 21, 269903, B25B 1100

Patent

active

044338350

ABSTRACT:
A wafer chuck and a wafer loading and unloading system wherein a flat support surface of the chuck has a plurality of peaks and valleys, with the peaks minimizing contact with the wafer, yet having sufficient contact area for wafer support without deformation. The peaks are provided with a top edge serving to dislodge particles from a wafer surface when loading the wafer onto the chuck. The loading system includes wafer pushing members for bringing a wafer to a desired position on the support surface.

REFERENCES:
patent: 499460 (1893-06-01), Hooper
patent: 661840 (1900-11-01), Baker
patent: 1631652 (1927-06-01), Sprenger et al.
patent: 3359879 (1967-12-01), Hamlin
patent: 3610613 (1971-10-01), Worder
patent: 3652075 (1972-03-01), Thompson
patent: 3711082 (1973-01-01), Seidenfaden
patent: 3787039 (1974-01-01), Zeichman
patent: 3982627 (1976-09-01), Isohata
patent: 4213698 (1980-07-01), Firtion et al.

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