Wafer centrifugal drying apparatus

Details Wafer centrifugal drying apparatus Wafer centrifugal drying apparatus

1987-06-05

1988-10-18

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 58, 34186, F26B 1732

Patent

active

047777320

ABSTRACT:
A centrifugal wafer drying apparatus comprises a rotor rotatably disposed in a container, a cradle mounted on the rotor, and a carrier mounted in the cradle and having grooves for receiving wafers. The carrier holds the wafers at an oblique angle with respect to a plane normal to the axis of rotation of the rotor, at least during rotation of the rotor.

REFERENCES:
patent: 4677759 (1987-07-01), Inamura

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