Wafer carrying device and wafer carrying method

Details Wafer carrying device and wafer carrying method Wafer carrying device and wafer carrying method

1997-07-24

1999-07-13

Kramer, Dean

Material or article handling

Article reorienting device

Article reoriented by contact with fluid means

414935, F16C 3206

Patent

active

059217448

ABSTRACT:
A device is provided for carrying a thin plate-like substrate such as a semiconductor wafer and for controlling the position of the wafer by floating it with an inert gas of low impurity concentration. A transferring unit and a control unit are both respectively provided with gas nozzles for floating a wafer and with a gas exhausting and circulating system. A plurality of transferring and control units are sealingly interconnected. Each control unit has a vacuum suction hole at its control center, and is provided with nozzles for controlling the wafer in the radial and circumferential directions, respectively, and with nozzles for stopping the wafer and for transporting the wafer to the next unit. On the bottom of a control space defined by each control unit, grooves which extend from the vacuum suction hole are formed for improving the positional accuracy of stopping the wafer. The grooves have closed ends which are located inside the periphery of the wafer when the center of the wafer is positioned above and centered on the control center of the control unit.

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