Wafer carrier process platform

Coating apparatus – Work holders – or handling devices

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Details

206334, 269903, 211 41, 118428, B05C 300

Patent

active

052704823

ABSTRACT:
A process platform for wafer carriers having a floor and a handle extending upwardly from the floor to define two floor portions for engaging wafer carriers on either side of the handle. The floor portions feature structures for orienting the wafer carriers either parallel or perpendicular to the handle and a peripheral gridwork of openings to permit fluid to flow easily through the floor to the wafer carriers. The handle features openings to permit fluid flow therethrough and bifurcated portions extending between the handle and side portions of the floor to lend stiffness to the platform.

REFERENCES:
patent: 3486631 (1969-12-01), Rodman
patent: 4609103 (1986-09-01), Bimer
Fluoroware, Inc., Commercial Product-admitted prior art 3 drawings attached FIG. 1-Top plan view; Section A--A (see FIG. 1); Section B--B (see FIG. 1).

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