Wafer carrier for chemical mechanical polishing

Details Wafer carrier for chemical mechanical polishing Wafer carrier for chemical mechanical polishing

1997-06-19

1999-12-28

Breneman, Bruce

Abrading

Machine

Rotary tool

451 63, 451 41, 451288, 451285, 451287, 156345, B24B 700

Patent

active

060074116

ABSTRACT:
A wafer carrier for chemical mechanical polishing. The carrier has a notch where wafers are placed for polishing and a ledge around the notch. An outer rim extends from the ledge and, during polishing, below the polished wafer compressing a polishing pad therebelow. Slurry is provided to the polishing pad, during polishing, by slurry channels through the carrier into the ledge. Excess slurry exits through the pad or, optionally, through a plurality of exit channels through the rim.

REFERENCES:
patent: 4323422 (1982-04-01), Calawa et al.
patent: 4940507 (1990-07-01), Harbarger
patent: 5040336 (1991-08-01), Ahern
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5394655 (1995-03-01), Allen et al.
patent: 5474644 (1995-12-01), Kato et al.
patent: 5486265 (1996-01-01), Salugsugan
patent: 5597346 (1997-01-01), Hempel, Jr.

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