Wafer-based ion traps

Details Wafer-based ion traps Wafer-based ion traps

2006-07-25

2006-07-25

Wells, Nikita (Department: 2881)

Radiant energy

Ionic separation or analysis

Static field-type ion path-bending selecting means

C250S292000, C250S282000, C250S288000, C216S002000, C313S326000

Reexamination Certificate

active

07081623

ABSTRACT:
An apparatus for an ion trap includes a semiconductor or dielectric wafer with front and back surfaces, a sequence of alternating conductive and dielectric layers formed over said front surface, and a bottom conductive layer. The sequence includes top and middle conductive layers, wherein the middle conductive layer is closer to the wafer than the top conductive layer. The middle conductive layer includes a substantially right cylindrical cavity that crosses a width of the middle conductive layer. The top and bottom conductive layers cap respective first and second ends of the cavity. The top conductive layer includes a hole that forms a first access port to the cavity. The wafer includes via through the width of the wafer. The via provides another access to the cavity via the back surface of the wafer. The wafer is substantially thicker than the sequence of layers.

REFERENCES:
patent: 2939952 (1960-06-01), Paul et al.
patent: 5166100 (1992-11-01), Gossard et al.
patent: 5248883 (1993-09-01), Brewer et al.
patent: 5501893 (1996-03-01), Laermer et al.
patent: 5793091 (1998-08-01), Devoe
patent: 6157031 (2000-12-01), Prestage
patent: 6459080 (2002-10-01), Yin et al.
patent: 6469298 (2002-10-01), Ramsey et al.
patent: 6762406 (2004-07-01), Cooks et al.
patent: WO 00/11208 (2000-03-01), None
patent: WO 01/22079 (2001-03-01), None
Cooks, et al., “Ion trap mass spectrometers: designs and potential applications,”Proceedings of the 49thASMS Conference on Mass Spectrometry and Allied Topics, Chicago, Illinois, 2 pages, May 27-31, 2001.
Hansel, W., et al., “Atom Chip for Transporting and Merging Magnetically Trapped Atom Clouds,”published online at xxx.lanl.gov, Publ. No. quant-ph/0008111, 3 pages, Dec. 12, 2001.
Drndic, M., et al., “Micro-electromagnets for atom manipulation,”Applied Physics Letters, vol. 72, No. 22, pp. 2906-2908, Jun. 1, 1998.
Folman, R., et al., “Controlling Cold Atoms using Nanofabricated Surfaces: Atom Chips,”Physical Review Letters, vol. 84, No. 20, pp. 4749-4752, May 15, 2000.
Bui, H.A., et al., “Windows Version of the Ion Trap Simulation Program ITSIM: a Powerful Heuristic and Predictive Tool in Ion Trap Mass Spectrometry,”Journal of Mass Spectrometry, vol. 33, pp. 297-304, John Wiley & Sons, Ltd., 1998.
Badman, E.R., et al., “Cylindrical Ion Trap Array with Mass Selection by Variation in Trap Dimensions,”Analytical Chemistry, vol. 72, No. 20, pp. 5079-5086, Oct. 15, 2000.
Kornienko, O., et al., “Field-Emission Cold-Cathode El Source for a Microscale Ion Trap Mass Spectrometer,”Anal. Chem., vol. 72, pp. 559-562, Feb. 1, 2000.
Reichel, J., et al., “Atomic Micromanipulation with Magnetic Surface Traps,”Physical Review Letters, vol. 83, No. 17, pp. 3398-3401, Oct. 25, 1999.
Sinha, M.P., “Development of a Miniaturized Gas Chromatograph-Mass Spectrometer with a Microbore Capillary Column and an Array Detector,”Anal. Chem., vol. 63, pp. 2012-2016, 1991.
Jefferts, S.R., et al., “Coaxial-resonator-driven rf (Paul) trap for strong confinement,”Physical Review A, vol. 51, No. 4, pp. 3112-3116, Apr. 1995.
Shivashankar, G.V., et al., “Single DNA molecule grafting and manipulation using a combined atomic force microscope and an optical tweezer,”Appl. Phys. Lett., vol. 71, pp. 3727-3729, 1997.
DeVoe, R.G., “Elliptical ion traps and trap arrays for quantum computation,”Physical Review A, vol. 58, No. 2, pp. 910-914, Aug. 1998.
Prestage, J.D. et al. “New ion trap for frequency standard applications,”J. Appl. Phys. vol. 66 (3), pp. 1013-1017, Aug. 1, 1989.
Jefferts, S.R., et al., “Paul Trap for Optical Frequency Standards,”IEEE Transactions on Instrumentation and Measurement, vol. 44, No. 2, pp. 148-150, Apr. 1995.
Folman, R., et al., “Mastering the language of atoms,”Nature, vol. 413, pp. 466-467, Oct. 4, 2001.
Muller, D., et al., “Guiding Neutral Atoms Around Curves with Lithographical Patterned Current-Carrying Wires,”Physical Review Letters, vol. 83, No. 25, pp. 5194-5197, Dec. 20, 1999.
Weinstein, J.D., et al., “Microscopic magnetic traps for neutral atoms,”Physical Review A, vol. 52, No. 5, pp. 4004-4009, Nov. 1995.
Denschlag, J., et al., “Guiding Neutral Atoms with a Wire,”Physical Review Letters, vol. 82, No. 10, pp. 2014-2017, Mar. 8, 1999.
Fortagh, J., et al., “Miniaturized Wire Trap for Neutral Atoms,”Physical Review Letters, vol. 81, No. 24, pp. 5310-5313, Dec. 14, 1998.
McAuley, S.A., et al., “Silicon micromachining using a high-density plasma source,”Journal of Physics D: Applied Physics, No. 34, pp. 2769-2774, 2001.
Brewer, R.G., et al., “Planar ion microtraps,”Physical Review A, vol. 46, No. 11, pp. R6781-6784, Dec. 1, 1992.
Hansel, W., et al., “Trapped-Atom-Interferometer in a Magnetic Microtrap,”Phys. Rev. A, vol. 64, Nov. 2001, pp. 0636027-1 to 0636027-6.
Badman, E.R., et al., “Fourier Transform Detection in a Cylindrical Quadrupole Ion Trap,”Analytical Chemistry, vol. 70, No. 17, pp. 3545-3547, Sep. 1, 1998.
Badman, E.R., et al., “A miniature Cylindrical Quadrupole Ion Trap: Simulation and Experiment,”Anal. Chem., vol. 70, No. 23, pp. 4896-4901, Dec. 1, 1998.
Ferran, R.J., et al., “High-pressure effects in miniature arrays of quadrupole analyzers for residual gas analysis from 10−9to 10−2Torr,” J. Vac. Sci. Technol. A 14(3), pp. 1258-1265, May/Jun. 1996.
Stalder, R.E., et al., “Micromachined array of electrostatic energy analyzers for charged particles,” J. Vac. Sci. Technol. A 12(4), pp. 2554-2558, Jul./Aug. 1994.
Wells, J.M., et al., “A Quadrupole Ion Trap with Cylindrical Geometry Operated in the Mass-Selective Instability Mode,” Analytical Chemistry, vol. 70, No. 3, pp. 438-444 Feb. 1, 1998.
Reichel, J., et al., “Applications of Integrated Magnetic Microtraps,” Appl. Phys. B 72 (2001), pp. 81-89.
Darling, R.B., et al., “Micromachined Faraday Cup Array Using Deep Reative Ion Etching,” Proc. 14thInt. Conf. Micro Electro Mechanical Systems, (MEMS-2001), presented Jan. 21-25, 2001, Interlaken, Switzerland, pp. 90-94.
Lammert, et al., “Developments on the Toroid Ion Trap Analyzer,” presented at the 47thASMS Conference on Mass Spectrometry and Allied Topics, Dallas, TX, 2 pages, Jun. 13-17, 1999.
March, R.E., “Quadrupole Ion Trap Mass Spectrometer,” Encyclopedia of Analytical Chemistry, pp. 11848-11872, John A. Wiley & Sons Ltd., Chichester, 2000.
Jonscher, K.R., et al., “The Whys and Wherefores of Quadrupole Ion Trap Mass Spectrometry,” Ion Trap Mass Spectrometry, published online at: http://www.abrf.org/ABRFNews/1996/September1996/sep96iontrap.html, 14 pages, Mar. 11, 2003.

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