Wafer backside removal to complete through-holes and provide...

Active solid-state devices (e.g. – transistors – solid-state diode – Physical configuration of semiconductor

Reexamination Certificate

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C438S462000, C257SE21484, C257SE21705

Reexamination Certificate

active

10925525

ABSTRACT:
A method used to form a semiconductor device comprises processing a semiconductor wafer to include one or more vias or through-holes only partially etched into the wafer, and scribe marks only partially etched into the wafer which define a plurality of semiconductor devices. Wafer material is removed from the back of the wafer to the level of the vias and scribe marks to form a via opening through the wafer while simultaneously dicing the wafer into individual semiconductor dice.

REFERENCES:
patent: 5185292 (1993-02-01), VanVonno et al.
patent: 5824595 (1998-10-01), Igel et al.
patent: 6107164 (2000-08-01), Ohuchi
patent: 6391685 (2002-05-01), Hikita et al.
patent: 6528393 (2003-03-01), Tao
patent: 2003/0232488 (2003-12-01), Chua et al.
“Toshiba Develops Paper-Thin Package”, Yoshihiko Hara, EE Times, Jun. 2, 1999.

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