Wafer and stage alignment using photonic devices

Details Wafer and stage alignment using photonic devices Wafer and stage alignment using photonic devices

2007-06-28

2010-10-05

Lauchman, L. G (Department: 2877)

Optics: measuring and testing

Position or displacement

Position transverse to viewing axis

C356S401000, C356S614000

Reexamination Certificate

active

07808657

ABSTRACT:
A position sensing system for an optical metrology system, includes a plurality of photonic devices distributed on a carrier for providing a photonic response when interrogated with a measuring light, wherein a collective photonic response from the plurality indicates the position of the carrier. A method and an optical metrology system are also provided.

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patent: 2005/0251279 (2005-11-01), Ray
patent: 2006/0279735 (2006-12-01), Van Haren et al.

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