Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Thinning of semiconductor substrate
Reexamination Certificate
2006-03-07
2006-03-07
Trinh, Michael (Department: 2822)
Semiconductor device manufacturing: process
Bonding of plural semiconductor substrates
Thinning of semiconductor substrate
C438S458000, C438S479000, C438S542000
Reexamination Certificate
active
07008859
ABSTRACT:
A method of producing a substrate that has a transfer crystalline layer transferred from a donor wafer onto a support. The transfer layer can include one or more foreign species to modify its properties. In the preferred embodiment an atomic species is implanted into a zone of the donor wafer that is substantially free of foreign species to form an embrittlement or weakened zone below a bonding face thereof, with the weakened zone and the bonding face delimiting a transfer layer to be transferred. The donor wafer is preferably then bonded at the level of its bonding face to a support. Stresses are then preferably applied to produce a cleavage in the region of the weakened zone to obtain a substrate that includes the support and the transfer layer. Foreign species are preferably diffused into the thickness of the transfer layer prior to implantation or after cleavage to modify the properties of the transfer layer, preferably its electrical or optical properties. The preferred embodiment produces substrates with a thin InP layer rendered semi-insulating by iron diffusion.
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Jalaguier et al., “Transfer of thin InP films onto silicon substrate by proton implantation process,” May, 1999.
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Jalaguier Eric
Le Vaillant Yves Mathieu
Letertre Fabrice
Commissariat à l'Energie Atomique (CEA)
S.O.I.Tec Silicon on Insulator Technologies S.A.
Trinh Michael
Winston & Strawn LLP
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