Wafer alignment station

Material or article handling – Article reorienting device – Article support means rotates about a shiftable pivot point

Patent

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Details

198394, 198395, 414754, 414757, 414786, B65G 4724

Patent

active

044576641

ABSTRACT:
An automatic wafer alignment station is disclosed for aligning a wafer having flats about its centroid with the flats oriented in a preselected spatial direction. The wafer is held by a vacuum chuck which is operatively connected to a motor driven carriage for controlled movement about an X axis, to a .theta. actuator carried by the carriage for controlled rotation about the axis of the chuck, and to a Z actuator carried by the carriage for controlled motion about a Z axis. An X capacitive sensor and a Z capacitive sensor are positioned near the wafer. An X processing and Z compensating circuit is responsive to the X and the Z capacitive sensor output signals and provides an electrical signal that has values which exclusively represent the position of the edge of the wafer along the X axis only over a predetermined angular range. Circuit means including an A/D converter and a microprocessor respond to the electrical signal and produce a plurality of corrective signals to the X, Y, and .theta. actuators for aligning the wafer about its centroid and for orienting the flats of the wafer in a preselected spatial orientation.

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patent: 3702923 (1972-11-01), Wiesler et al.
patent: 3785507 (1974-01-01), Wiesler et al.
patent: 4024944 (1977-05-01), Adams et al.
patent: 4103232 (1978-07-01), Sugita et al.
patent: 4240032 (1980-12-01), Johnson et al.

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