Wafer alignment device

Details Wafer alignment device Wafer alignment device

1983-02-28

1985-10-08

Rosenberger, R. A.

Optics: measuring and testing

By alignment in lateral direction

With light detector

356401, 250557, G05D 300

Patent

active

045456836

ABSTRACT:
Zone plate alignment aids on a mask and semiconductor wafer are used in a projection type system for aligning the wafer and mask prior to transfer of a circuit pattern from the mask to the wafer in an exposure process. The condenser system includes an aperture in the shape of a chevron or other convenient alignment pattern while the viewing system of the device is provided with a complementary shaped pupil stop. The condenser aperture and the viewing system stop cofunction to enhance the image contrast seen through the viewing system.

REFERENCES:
patent: 4259019 (1981-03-01), Johannsmeier et al.
patent: 4269505 (1981-05-01), Mayer
patent: 4326805 (1982-04-01), Feldman et al.

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