Wafer aligners

Material or article handling – Article reorienting device – Article reoriented by contact with fluid means

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Details

406 87, 414774, B65G 5102, B65G 4724

Patent

active

044250754

ABSTRACT:
An apparatus for prealigning a silicon wafer prior to transfer to a work station. The wafer is spun on an aligning platform by means of air jets emanating from holes disposed in the surface of the platform while simultaneously being stopped by means of a vacuum source communicating with the surface of the platform. Sensor means detect when the wafer is centered within a first predetermined tolerance to turn off the air jets and vacuum to stop the wafer. Control means responsive to the sensor means then center the wafer to within a second predetermined tolerance. The wafer is then transported to the work station for processing.

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patent: 3890508 (1975-06-01), Sharp
patent: 3930684 (1976-01-01), Lasch, Jr. et al.
patent: 3982627 (1976-09-01), Isohata
patent: 4165132 (1979-08-01), Hassan et al.
patent: 4219110 (1980-08-01), Ubukata
patent: 4242038 (1980-12-01), Santini et al.
Gardineer, B. G. and S. A. Manning; Automatic Edge Location for Pneumatic Orientor; IBM Technical Disclosure Bulletin; vol. 20, No. 2; Jul. 1977.
O'Neill, B. C., J. A. Paivanas, E. S. Pearson; Annular Orientor; IBM Technical Disclosure Bulletin, vol. 20, No. 2, Jul. 1977.
Gardineer, B. G; Pneumatic Orientor Adaptive Pulse Sequence; IBM Technical Disclosure Bulletin, vol. 20, No. 6, Nov. 1977.

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