Wafer airtight keeping unit and keeping facility thereof

Details Wafer airtight keeping unit and keeping facility thereof Wafer airtight keeping unit and keeping facility thereof

1992-01-28

1994-04-19

Bennett, Henry A.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34218, 34 36, F26B 2106

Patent

active

053034821

ABSTRACT:
A wafer keeping apparatus includes a closed wafer keeping space, and an arrangement for circulating an inert gas through a filter and then through the wafer keeping space. In one embodiment, several wafer keeping shelves are each provided within the space, and the inert gas is supplied through a respective filter to flow across each shelf. In another embodiment, a plurality of wafer keeping spaces are each accessible through a respective door which forms an airtight seal when it is closed, and respective filters are provided on opposite sides of the space, the inert gas being supplied to the space through one filter and exiting the space through the other filter. In a further embodiment, several of the wafer keeping spaces are provided at angularly and vertically spaced locations in a rotatable stocker body provided within a casing, and several vertically spaced doors are provided on the casing to provide access to respective wafer keeping spaces in the stocker body.

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