Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation
Patent
1979-02-23
1982-03-30
McGraw, Vincent P.
Optics: measuring and testing
By dispersed light spectroscopy
With sample excitation
356417, 250372, G01N 2173
Patent
active
043221653
ABSTRACT:
A VUV plasma atomic emission apparatus system and method is distinguished by the features of a plasma purge chamber about the plasma generated by the system, a chromator in optical communication and closed gaseous communication with said plasma, preferably through a common port in said plasma purge chamber, purge gas supply means for purging said chromator and ultimately said plasma purge chamber through said common port, vent means preferably operable by draft to continuously exhaust gases from said plasma purge chamber, and focusing means between the plasma and chromator for focusing light from an excited sample introduced into or near said plasma onto said chromator. The continuous gas purging feature establishes a steady state gaseous environment of minimum absorption characteristics to the specific wavelengths of interest, thus expanding the energy band that may be reliably detected (i.e., particularly the difficult 160-200 nanometer band), and which result is accomplished with excellent reproducibility of data and sensitivity.
REFERENCES:
patent: 4009413 (1977-02-01), Elliott et al.
"Plasma Atomic Emission Spectroscopic Determination of Sulfur" Ellebracht's thesis; pp. 49-55; Aug. 77.
Anal. Chim. Acta 62, 1972, pp. 241-250.
Anal. Chim. Acta 64, 1977, pp. 353-362.
Anal. Chemistry; vol. 44, #14; Dec. 1972, pp. 2379-2382.
"A Controlled-Atmosphere Plasma Arc For Emission Spectrography Of Nonmetal Elements", Heemstra, Applied Spectroscopy, vol. 24, No. 6, 1970, pp. 568-572.
Applied Spectroscopy; vol. 28 #2; 1974; pp. 191-192.
Ellebracht Stephen R.
Fairless Charles M.
McGraw Vincent P.
The Dow Chemical Company
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