Electricity: measuring and testing – Using ionization effects – For analysis of gas – vapor – or particles of matter
Patent
1989-03-31
1990-05-22
Eisenzopf, Rienhard J.
Electricity: measuring and testing
Using ionization effects
For analysis of gas, vapor, or particles of matter
324439, 324453, 2041531, G01N 2742, G01N 2704
Patent
active
049280651
ABSTRACT:
A method and apparatus for classifying non-aqueous liquid suspensions of charged particles employs a large time-varying electric field applied to a suspension situated between capacitive test electrodes. A current waveform is produced that characterizes the suspension with respect to critical properties including concentration, mobility, and plating tendencies of the charged particles suspended therein. The approach is suitable for use with suspensions having relative permitivity constants of about 15 or less.
REFERENCES:
patent: 3844940 (1974-10-01), Kopf et al.
patent: 3906353 (1975-09-01), Murdock
patent: 3906354 (1975-09-01), Murdock
patent: 4119909 (1978-10-01), DeBerry
patent: 4132944 (1972-01-01), Bentz
patent: 4227151 (1980-10-01), Ellis
patent: 4336111 (1982-06-01), Graunke
patent: 4411741 (1983-10-01), Janata
patent: 4443763 (1984-04-01), Marsoner
patent: 4528270 (1985-07-01), Matsunaga
patent: 4631116 (1986-12-01), Ludwig
patent: 4654126 (1987-03-01), Amelio et al.
patent: 4725339 (1988-02-01), Bindra et al.
patent: 4735691 (1988-04-01), Green et al.
Wells; "The Question of Instrumental Artifact in Linear Sweep Voltammetry . . . " Analitye Chemistry-Jan. 1971-USll 324/439.
Lane Gregg A.
Pearlstine Kathryn
E. I. Du Pont de Nemours and Company
Eisenzopf Rienhard J.
Solis Jose M.
LandOfFree
Voltammetry in low-permitivity suspensions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Voltammetry in low-permitivity suspensions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Voltammetry in low-permitivity suspensions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2136910