Voltage programmable links for integrated circuits

Semiconductor device manufacturing: process – Direct application of electrical current – To alter conductivity of fuse or antifuse element

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438600, H01L 2182

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active

056417039

ABSTRACT:
Methods and systems are discussed for fabricating electrically programmable link structures by fabricating a first metal conductor of a refractory conductive material, composite, or an aluminum alloy which has been modified with a refractory material, then fabricating an insulating link material over the first conductor, and subsequently, depositing a second conductor over the link material. In use, an electrical path can be formed between the first and second conductors by applying a voltage between such conductors across at least one selected region of the insulator, such that the insulating link material is transformed in the region and rendered conductive to form an electrical signal path.

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