Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2005-04-07
2008-12-09
Gonzalez, Porfirio Nazario (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C427S248100, C427S250000
Reexamination Certificate
active
07462732
ABSTRACT:
A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).
REFERENCES:
Werndrup et al., Polyhedron, vol. 20, pp. 2163-2169 (2001).
Hubert-Pfalzgraf et al., Polyhedron, vol. 16, No. 24, pp. 4197-4203 (1997).
Seisenbaeva et al., New J. Chem., vol. 27, pp. 1059-1064 (2003).
Park et al., Inorganic Chemistry Communications, vol. 7, pp. 463-466 (2004).
Yang et al., J. Vac. Sci. Technol. A., vol. 23, No. 4, pp. 1238-1243 (Jul./Aug. 2005).
An Ki-Seok
Chung Taek-Mo
Kim Chang-Gyoun
Kim Yunsoo
Lee Sun-Sook
Baker & Hostetler LLP
Gonzalez Porfirio Nazario
Korea Research Institute of Chemical Technology
LandOfFree
Volatile nickel aminoalkoxide complex and deposition of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Volatile nickel aminoalkoxide complex and deposition of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Volatile nickel aminoalkoxide complex and deposition of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4048084