Volatile copper(II) complexes and reducing agents for...

Details Volatile copper(II) complexes and reducing agents for... Volatile copper(II) complexes and reducing agents for...

2006-08-08

2006-08-08

Nazario-Gonzalez, Porfirio (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C556S110000, C546S002000, C427S255280, C428S411100

Reexamination Certificate

active

07087774

ABSTRACT:
The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process.

REFERENCES:
patent: 3594216 (1971-07-01), Charles
patent: 5464666 (1995-11-01), Fine et al.
patent: 2005/0003075 (2005-01-01), Bradley et al.
patent: 2005/0227007 (2005-10-01), Bradley et al.
patent: 4202889 (1993-08-01), None
patent: WO 03/044242 (2003-05-01), None
McGeachin, Synthesis and properties of some β-diketimines derived from acetylacetone, and their metal complexes, Canadian Journal of Chemistry, vol. 46, 1903-1912, 1968.
N. A. Domnin et al., Zh. Organ. Khim, 1965, 1(1), pp. 658, Reactions of β-Dicarbonyl Compounds with Hydrazines.
M. Ritala and M. Leskela in“Atomic Layer Deposition” in Handbook of Thin Film Materials, H. S. Nalwa, Editor, Academic Press, San Diego, 2002, vol. 1, Chapter 2.

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