Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2006-01-03
2006-01-03
Nazario-Gonzalez, Porfirio (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C427S250000, C427S255110, C427S593000, C438S681000
Reexamination Certificate
active
06982341
ABSTRACT:
A volatile copper aminoalkoxide complex of formula (I) can form a copper thin film having an improved quality by metal organic chemical vapor deposition (MOCVD):wherein, R1, R2, R3and R4are each independently C1-4alkyl optionally carrying one or more fluorine substituents; and m is an integer in the range of 1 to 3.
REFERENCES:
patent: 6369256 (2002-04-01), Chi et al.
patent: 6822107 (2004-11-01), Baum et al.
Ralf Becker, et al.,A Study on the Metal-Organic CVD of Pure Copper Films From Low Cost Copper(II)Dialkylamino-2-propoxides: Tuning of the Thermal Properties of the Precursor by Small Variations of the Lignad., Chemical Vapor Deposition, 2003, 9, No. 3, p. 149-156.
An Ki-Seok
Chung Taek-Mo
Jang Hong Suk
Kim Chang Gyoun
Kim Yunsoo
Anderson Kill & Olick PC
Korea Research Institute of Chemical Technology
Nazario-Gonzalez Porfirio
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