Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-10-12
1993-01-05
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430394, 430396, 355 47, 355 49, 355 52, 355 66, G03B 2732, G03B 2768
Patent
active
051769700
ABSTRACT:
Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position.
REFERENCES:
patent: 4166694 (1979-09-01), Horning et al.
patent: 4198147 (1980-04-01), Alasia
Ceglio Natale M.
Hawryluk Andrew M.
Duda Kathleen
McCamish Marion E.
Moser William R.
Sartorio Henry P.
The United States of America as represented by the United States
LandOfFree
Virtually distortion-free imaging system for large field, high r does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Virtually distortion-free imaging system for large field, high r, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Virtually distortion-free imaging system for large field, high r will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2390165