Virtual gauging method for use in lithographic processing

Details Virtual gauging method for use in lithographic processing Virtual gauging method for use in lithographic processing

2006-05-23

2006-05-23

Allen, Stephone B. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C356S400000, C355S053000

Reexamination Certificate

active

07049618

ABSTRACT:
A virtual gauging method for use in a lithographic process includes gauging a region at a surface of a wafer when the region is located away from an axis of illumination producing wafer surface data, while other portions of the wafer are being illuminated. The method also includes acquiring time-domain measurements representing the wafer surface data and converting the time-domain measurements into space-domain measurements. This conversion can be done using a finite-impulse-response (FIR) filter. The FIR filter can be triggered with a spatial interrupt, and a width of the FIR filter is modified in response to a velocity of travel of the wafer. The method further includes converting space-domain measurements into wafer correction data.

REFERENCES:
patent: 5825043 (1998-10-01), Suwa
patent: 6057908 (2000-05-01), Ota
patent: 6118515 (2000-09-01), Wakamoto et al.
patent: 6122036 (2000-09-01), Yamasaki et al.
patent: 6608681 (2003-08-01), Tanaka et al.
patent: 6633050 (2003-10-01), Lyons
patent: 0 834 773 (1998-04-01), None
patent: 1 052 683 (2000-11-01), None
International Search Report for International Application No. PCT/US00/40635, mailed May 28, 2001 (7 pages).

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