Vinylidene-silicon-compound and a process for its production

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

556435, C07F 708, C07F 718

Patent

active

043955622

ABSTRACT:
A novel silicone compound having a group such as methoxy group, which can be bonded to an inorganic substance and a vinylidene group and being useful as a silane coupling agent. The compound has the following general formula ##STR1## where R is an alkyl group of 1 to 7 carbon atoms or a hydrogen atom; R' and R" respectively represent an alkyl group of 1 to 7 carbon atoms; X and X' respectively represent a chlorine atom or an alkoxy group of 1 to 4 carbon atoms; and n and m respectively represent an integer of 0 to 3.
The compound is prepared by reacting an alkyl allene represented by the general formula H.sub.2 C.dbd.C.dbd.CHR with a disilane represented by the general formula R'.sub.n X.sub.3-n Si.sub.2 R".sub.m X'.sub.3-n (where R, R', R", X, X', n and m are as defined above) in the presence of a phosphine complex of a transition metal.

REFERENCES:
patent: 2561429 (1951-07-01), Sveda
patent: 2588083 (1952-03-01), Burkhard et al.
patent: 3322807 (1967-05-01), Johnson
patent: 3470226 (1969-09-01), Plumb et al.
patent: 3666783 (1972-05-01), LeFort
Journal of Organometallic Chemistry, 199 (1980), 43-47, 185-193, H. Matsumoto et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vinylidene-silicon-compound and a process for its production does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vinylidene-silicon-compound and a process for its production, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vinylidene-silicon-compound and a process for its production will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2222885

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.