Vinylidene fluoride resin film and metallized film thereof

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428421, 428461, 526250, 526255, 264565, 2642902, 26433114, C08F 1422, B32B 2706

Patent

active

047312882

ABSTRACT:
A vinylidene fluoride resin film having (1) a crystal melting point of 182.degree. C. or higher as measured by differential scanning calorimeter in nitrogen atmosphere at a temperature elevation speed of 10.degree. C./min; (2) a diffraction point corresponding to (1 1 .zeta.) of the .alpha.-phase crystal in the wide angle X-ray diffraction photograph; and (3) an orientation degree of the crystal of 0.85 or more when measured under irradiation of X-ray incident vertically on a major surface of the film. The vinylidene fluoride resin film is obtained by inflation accompanying melt necking stretching. The film has improved mechanical properties and heat-stability and is also adapted for use as a base film of a metallized film.

REFERENCES:
patent: 3707592 (1972-12-01), Ishii et al.
patent: 3925339 (1975-12-01), Ishii et al.
patent: 3931446 (1976-01-01), Murayama et al.
patent: 4290983 (1981-09-01), Sasaki et al.
patent: 4298719 (1981-11-01), Mizuno et al.
patent: 4546158 (1985-10-01), Mizuno et al.

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