Vibratory beam electromechanical resonator

Electrical generator or motor structure – Non-dynamoelectric – Piezoelectric elements and devices

Reexamination Certificate

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C310S363000

Reexamination Certificate

active

06873088

ABSTRACT:
A resonator formed by the steps of defining an active single-crystal silicon layer delimited by a buried insulator layer, depositing a silicon-germanium layer by a selective epitaxy method so that the silicon-germanium layer grows above the active single-crystal silicon area, depositing by a non-selective epitaxy method a silicon layer and etching it according to a desired contour, and removing the silicon-germanium by a selective etching with respect to the silicon and to the insulator.

REFERENCES:
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patent: 6046524 (2000-04-01), Yamanouchi et al.
patent: 6198197 (2001-03-01), Yamanouchi et al.
patent: 6249073 (2001-06-01), Nguyen et al.
patent: 6333547 (2001-12-01), Tanaka et al.
patent: 6355498 (2002-03-01), Chan et al.
patent: 6555482 (2003-04-01), Skotnicki et al.
patent: 20010030489 (2001-10-01), Nguyen
patent: 20010031025 (2001-10-01), Nguyen
patent: 20010033119 (2001-10-01), Nguyen
patent: 20010033121 (2001-10-01), Nguyen
patent: 2000101386 (2000-04-01), None
French Search Report from French Patent Application No. 01/04510, filed Apr. 3, 2001.

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