Via structure to improve routing of wires within an...

Computer-aided design and analysis of circuits and semiconductor – Integrated circuit design processing – Physical design processing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S112000, C716S135000

Reexamination Certificate

active

07962881

ABSTRACT:
In consideration for the fact that a connection on the upper layers of an integrated circuit needs to access a lower layer to connect to, e.g., a transistor, at least one via on each layer is required below the top layer used by a connection for each pin. The vias (i.e., the connection structures between wiring planes within an integrated circuit) are arranged such that the number of wiring resources blocked on the lower layers is reduced. Various rules govern which vias are chosen. The main characteristic is to elect only a certain number of wiring channels appropriate for the vias on a single layer and then apply an optimization within the restricted elected wiring channels on that layer to select the most appropriate vias.

REFERENCES:
patent: 4613941 (1986-09-01), Smith et al.
patent: 5068603 (1991-11-01), Mahoney
patent: 6026224 (2000-02-01), Darden et al.
patent: 6686768 (2004-02-01), Comer
patent: 6880143 (2005-04-01), Yu
patent: 6938234 (2005-08-01), Teig et al.
patent: 7003748 (2006-02-01), Hsu
patent: 7080329 (2006-07-01), Teig et al.
patent: 7272803 (2007-09-01), Hsu
patent: 7308669 (2007-12-01), Buehler et al.
patent: 7614024 (2009-11-01), Bothra
patent: 7624367 (2009-11-01), Frankle et al.
patent: 7634751 (2009-12-01), Ueda
patent: 7689960 (2010-03-01), Park et al.
patent: 2006/0048088 (2006-03-01), Nakano
patent: 2006/0265684 (2006-11-01), Buehler et al.
patent: 2007/0262454 (2007-11-01), Shibata
patent: 2007/0294657 (2007-12-01), Hsu
patent: 2008/0111158 (2008-05-01), Sherlekar et al.
Sai-Halasz, George A., Performance Trends in High-End Processors; Proceedings of the IEEE, vol. 83; Jan. 1995; No. 1; pp. 20-36.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Via structure to improve routing of wires within an... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Via structure to improve routing of wires within an..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Via structure to improve routing of wires within an... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2709336

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.