Via array monitor and method of monitoring induced...

Semiconductor device manufacturing: process – With measuring or testing

Reexamination Certificate

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C438S017000, C438S622000, C438S926000

Reexamination Certificate

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06939726

ABSTRACT:
An electrical monitor comprising a via array and method for determining and reducing an electrically charged state of a semiconductor process wafer the method including providing a metal filled via array including a plurality of interspersed electrically isolated dummy metal portions to form a via array monitor; exposing the semiconductor process wafer including the via array monitor to an electrical charge altering process including to produce an electrically charged state over at least a portion of the semiconductor wafer; carrying out electrical measurements of the via array monitor to determine a level of the electrically charged state; and, carrying out an electrically charge neutralizing process to reduce a level of the electrically charged state to a predetermined acceptable level prior to carrying out a subsequent process.

REFERENCES:
patent: 5315145 (1994-05-01), Lukaszek
patent: 5844300 (1998-12-01), Alavi et al.
patent: 6300756 (2001-10-01), Sturm et al.
patent: 6771092 (2004-08-01), Fung et al.
patent: 2001/0011887 (2001-08-01), Sturm et al.
patent: 2002/0130260 (2002-09-01), McCord et al.
patent: 2003/0216047 (2003-11-01), Hu et al.
patent: 2004/0115943 (2004-06-01), Yao et al.
patent: 2005/0032253 (2005-02-01), Hsu et al.

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